Laser lithography

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  • Published date: February 6, 2016
  • Modified date: February 7, 2016
    • Ankara, Turkey

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Lithography is the term for microstructure formation on chips. Currently most of the microfluidic chips (except 3D printing chips) are fabricated by using UV, focused ion beam, electron beam, or laser beam to form desired shapes on wafers coated by photoresists or similar materials.

We currently use maskless laser lithography system. The device uses a 405nm fiber laser with 1um condensed beam size and apply structures drawn by CAD softwares direcly on photoresists.

Important points during experimental protocol are as below:

The min feature size can be 1um (which is laser beam size) but this is also depends on the photoresist coating thickness. Photoresists thickness higher than 1um causes the higher min. feature sizes.
The application time of laser lithograpy depends on the total size of the CAD design. For longer process times, user should be sure about the endurance of exposed photoresist.

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Serhat Sevli
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